Effect of compressive and tensile strain on misfit dislocation injection in SiGe epitaxial layers

Schorer, R. and Wegscheider, Werner and Abstreiter, Gerhard (1993) Effect of compressive and tensile strain on misfit dislocation injection in SiGe epitaxial layers. Journal of Vacuum Science & Technology B 11 (3), pp. 1056-1063.

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Item Type:Article
Institutions: Physics > Institute of Experimental and Applied Physics > Retired Professors > Group Werner Wegscheider
Subjects:500 Science > 530 Physics
Status:Published
Refereed:Unknown
Created at the University of Regensburg:Unknown
Owner:Martin Kaiser
Deposited On:26 Oct 2009 15:26
Last Modified:20 Jul 2011 23:51
Item ID:10015
Owner Only: item control page