Rogge, M. C. and Fühner, C. and Keyser, U. F. and Bichler, Max and Abstreiter, Gerhard and Wegscheider, Werner and Haug, R. J.
Fabrication of double quantum dots by combining afm and e-beam lithography.
Physica E Low-dimensional Systems and Nanostructures 21 (2-4), pp. 483-486.
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In recent years several attempts have been made to fabricate coupled quantum dots as a crucial element of quantum computing devices. One important challenge is to achieve a reliable control of the interdot tunneling. For this purpose we have combined direct nanolithography by local anodic oxidation (LAO) with standard electron-beam lithography. LAO is used to produce parallel double quantum dots. ...
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