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Fabrication of double quantum dots by combining afm and e-beam lithography

Rogge, M. C. and Fühner, C. and Keyser, U. F. and Bichler, Max and Abstreiter, Gerhard and Wegscheider, Werner and Haug, R. J. (2004) Fabrication of double quantum dots by combining afm and e-beam lithography. Physica E Low-dimensional Systems and Nanostructures 21 (2-4), pp. 483-486.

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Abstract

In recent years several attempts have been made to fabricate coupled quantum dots as a crucial element of quantum computing devices. One important challenge is to achieve a reliable control of the interdot tunneling. For this purpose we have combined direct nanolithography by local anodic oxidation (LAO) with standard electron-beam lithography. LAO is used to produce parallel double quantum dots. ...

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Item Type:Article
Date:March 2004
Institutions:Physics > Institute of Experimental and Applied Physics > Retired Professors > Group Werner Wegscheider
Identification Number:
ValueType
doi:10.1016/j.physe.2003.11.054DOI
Classification:
NotationType
73.21.La; 73.23.Hk; 73.40.GkPACS
Subjects:500 Science > 530 Physics
Status:Published
Refereed:Unknown
Created at the University of Regensburg:Unknown
Owner: Martin Kaiser
Deposited On:11 Jan 2010 13:31
Last Modified:13 Mar 2014 12:22
Item ID:11955
Owner Only: item control page
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