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Growth of crack-free GaN on Si(1 1 1) with graded AlGaN buffer layers

Able, Andreas and Wegscheider, Werner and Engl, Karl and Zweck, Josef (2005) Growth of crack-free GaN on Si(1 1 1) with graded AlGaN buffer layers. Journal of Crystal Growth 276 (3-4), pp. 415-418.

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Abstract

Hexagonal GaN films on Si(1 1 1) substrates have been grown by metalorganic vapor phase epitaxy (MOVPE). High-temperature AlN buffers provided a reliable diffusion barrier to avoid meltback etching. By introducing a thick, graded AlGaN buffer layer, the critical thickness for cracking has been increased to at least 2µm. The films have been characterized by optical microscopy, transmission electron microscopy (TEM) and X-ray diffraction.


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Item Type:Article
Date:April 2005
Institutions:Physics > Institute of Experimental and Applied Physics > Retired Professors > Group Werner Wegscheider
Identification Number:
ValueType
doi:10.1016/j.jcrysgro.2004.12.003DOI
Classification:
NotationType
81.05.Ea; 81.15.GhPACS
Keywords:A3. Metalorganic vapor phase epitaxy; B1. Nitrides; B2. Semiconducting III–V materials
Subjects:500 Science > 530 Physics
Status:Published
Refereed:Unknown
Created at the University of Regensburg:Unknown
Deposited On:11 Jan 2010 13:33
Last Modified:13 Mar 2014 12:23
Item ID:11960
Owner Only: item control page

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