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Wegscheider, Werner ; Pfeiffer, Loren N. ; West, Kenneth W. ; Pinczuk, A. ; Dignam, M. M. ; Hull, R. ; Leibenguth, R. E.

GaAs/AlGaAs quantum wire lasers fabricated by cleaved edge overgrowth

Wegscheider, Werner, Pfeiffer, Loren N., West, Kenneth W., Pinczuk, A., Dignam, M. M., Hull, R. and Leibenguth, R. E. (1995) GaAs/AlGaAs quantum wire lasers fabricated by cleaved edge overgrowth. Journal of Crystal Growth 150 (1), pp. 285-292.

Date of publication of this fulltext: 02 Nov 2009 14:09
Article
DOI to cite this document: 10.5283/epub.10835


Abstract

We have used the molecular beam growth technique which we call “cleaved edge overgrowth” to fabricate quantum wire lasers, in which 1D quantum confinement is entirely defined by the growth process. The active region of our lasers consists of atomically precise quantum wires that form at the T-shaped intersections of 7 nm wide GaAs quantum wells grown along the [001] crystal axis and after an in ...

We have used the molecular beam growth technique which we call “cleaved edge overgrowth” to fabricate quantum wire lasers, in which 1D quantum confinement is entirely defined by the growth process. The active region of our lasers consists of atomically precise quantum wires that form at the T-shaped intersections of 7 nm wide GaAs quantum wells grown along the [001] crystal axis and after an in situ cleave along the [110] crystal axis. The origin of the quantum mechanical bound state is the relaxation of quantum well confinement at this intersection. The high degree of structural perfection achievable in this way allows the observation of stimulated optical emission from the lowest exciton state in optically as well as in electrically pumped devices. The formation of a linear p-n junction in which the quantum wires are embedded is achieved by doping with Be and Si in the two orthogonal growth directions. Efficient current injection into the wires is demonstrated by the almost complete suppression of optical emission from the quantum well states as well as by threshold currents as low as 0.4 mA for uncoated devices at 1.7 K.



Involved Institutions


Details

Item typeArticle
Journal or Publication TitleJournal of Crystal Growth
Publisher:Elsevier
Volume:150
Number of Issue or Book Chapter:1
Page Range:pp. 285-292
Date1 May 1995
InstitutionsPhysics > Institute of Experimental and Applied Physics > Alumni or Retired Professors > Group Werner Wegscheider
Identification Number
ValueType
10.1016/0022-0248(95)80222-XDOI
Dewey Decimal Classification500 Science > 530 Physics
StatusPublished
RefereedUnknown
Created at the University of RegensburgUnknown
Item ID10835

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