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- URN to cite this document:
- urn:nbn:de:bvb:355-epub-347593
- DOI to cite this document:
- 10.5283/epub.34759
Alternative links to fulltext:DOI
Abstract
A high-speed direct electron detection system is introduced to the field of transmission electron microscopy and applied to strain measurements in semiconductor nanostructures. In particular, a focused electron probe with a diameter of 0.5 nm was scanned over a fourfold quantum layer stack with alternating compressive and tensile strain and diffracted discs have been recorded on a ...

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