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Self-Diffusion in Amorphous Silicon by Local Bond Rearrangements

Kirschbaum, Jochen, Teuber, T., Donner, A., Radek, M., Bougeard, Dominique, Böttger, R., Lundsgaard Hansen, J., Nylandsted Larsen, A., Posselt, M. and Bracht, H. (2018) Self-Diffusion in Amorphous Silicon by Local Bond Rearrangements. Physical Review Letters 120, p. 225902.

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Date of publication of this fulltext: 11 Jun 2018 11:19

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Item type:Article
Date:31 May 2018
Institutions:Physics > Institute of Experimental and Applied Physics > Chair Professor Huber > Group Dominique Bougeard
Identification Number:
ValueType
10.1103/PhysRevLett.120.225902DOI
Dewey Decimal Classification:500 Science > 530 Physics
Status:Published
Refereed:Yes, this version has been refereed
Created at the University of Regensburg:Partially
Item ID:37384
Owner only: item control page

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