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Spectral hole burning on silicon phthalocyanines isolated in an argon matrix
Braun, Dieter, Ceulemans, Arnout, Dick, Bernhard und Konami, Hideo (1994) Spectral hole burning on silicon phthalocyanines isolated in an argon matrix. Chemical Physics Letters 225 (4-6), S. 398-403.Veröffentlichungsdatum dieses Volltextes: 05 Aug 2009 13:50
Artikel
DOI zum Zitieren dieses Dokuments: 10.5283/epub.5491
Zusammenfassung
Irradn. of the monomeric phthalocyanine Hex3SiO(SiPc)OSiHex3 isolated in an Ar matrix at T = 13 K with the 632.8 nm line of a He/Ne laser produces a resonant spectral hole in the vibrational sideband located .apprx.700 cm-1 above the origin of the Q band. This hole is accompanied by several sideholes in the origin region. These permit a precise detn. of several excited-state vibrational ...
Irradn. of the monomeric phthalocyanine Hex3SiO(SiPc)OSiHex3 isolated in an Ar matrix at T = 13 K with the 632.8 nm line of a He/Ne laser produces a resonant spectral hole in the vibrational sideband located .apprx.700 cm-1 above the origin of the Q band. This hole is accompanied by several sideholes in the origin region. These permit a precise detn. of several excited-state vibrational frequencies. For dimeric Hex3SiO(SiPc-O-SiPc)OSiHex3 in the same matrix the changes in the absorption spectra after irradn. into the Q band reveal an out-of-plane polarization of the bands which are not present in the monomer absorption. This points to substantial charge-resonance contributions to the excitonic coupling between the 2 SiPc units in dimeric Hex3SiO(SiPc-O-SiPc)OSiHex3.
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| Dokumentenart | Artikel | ||||||
| Titel eines Journals oder einer Zeitschrift | Chemical Physics Letters | ||||||
| Verlag: | Elsevier | ||||||
|---|---|---|---|---|---|---|---|
| Band: | 225 | ||||||
| Nummer des Zeitschriftenheftes oder des Kapitels: | 4-6 | ||||||
| Seitenbereich: | S. 398-403 | ||||||
| Datum | 1994 | ||||||
| Zusätzliche Informationen (Öffentlich) | CAN 121:267508 74-1 Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes 92984-77-5 Role: FMU (Formation, unclassified), PRP (Properties), FORM (Formation, nonpreparative) (formation from spectral hole burning on silicon phthalocyanines isolated in argon matrix); 92396-89-9 Role: PRP (Properties), RCT (Reactant), RACT (Reactant or reagent) (spectral hole burning in argon matrix-isolated) | ||||||
| Institutionen | Chemie und Pharmazie > Institut für Physikalische und Theoretische Chemie > Chair of Chemistry III - Physical Chemistry (Molecular Spectroscopy and Photochemistry) > Prof. Dr. Bernhard Dick | ||||||
| Identifikationsnummer |
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| Stichwörter / Keywords | Spectral hole burning (on silicon phthalocyanines isolated in argon matrix); Exciton (spectral hole burning on silicon phthalocyanines isolated in argon matrix in relation to); silicon phthalocyanine hole burning argon matrix | ||||||
| Dewey-Dezimal-Klassifikation | 500 Naturwissenschaften und Mathematik > 540 Chemie | ||||||
| Status | Veröffentlicht | ||||||
| Begutachtet | Ja, diese Version wurde begutachtet | ||||||
| An der Universität Regensburg entstanden | Ja | ||||||
| URN der UB Regensburg | urn:nbn:de:bvb:355-epub-54918 | ||||||
| Dokumenten-ID | 5491 |
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