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Ploch, Simon ; Wernicke, Tim ; Thalmair, Johannes ; Lohr, Matthias ; Pristovsek, Markus ; Zweck, Josef ; Weyers, Markus ; Kneissl, Michael

Topography of (202¯1) AlGaN, GaN and InGaN layers grown by metal-organic vapor phase epitaxy

Article

Ploch, Simon, Wernicke, Tim, Thalmair, Johannes, Lohr, Matthias, Pristovsek, Markus , Zweck, Josef, Weyers, Markus and Kneissl, Michael (2012) Topography of (202¯1) AlGaN, GaN and InGaN layers grown by metal-organic vapor phase epitaxy. Journal of Crystal Growth 356, pp. 70-74.



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Details

Item typeArticle
Journal or Publication TitleJournal of Crystal Growth
PublisherELSEVIER SCIENCE BV
Place of PublicationAMSTERDAM
Volume356
Page Rangepp. 70-74
Date2012
Date of publication19 Dec 2024 09:35
InstitutionsPhysics > Institute of Experimental and Applied Physics > Alumni or Retired Professors > Chair Professor Back > Group Josef Zweck
Identification Number
ValueType
10.1016/j.jcrysgro.2012.07.016DOI
Keywords; Crystal morphology; Metal-organic vapor phase epitaxy; Nitrides; Semiconducting gallium compounds
Dewey Decimal Classification500 Science > 530 Physics
StatusPublished
RefereedYes, this version has been refereed
Created at the University of RegensburgYes
Item ID63356

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