Go to content
UR Home

Analysis of Airborne Contamination on Transition Metal Dichalcogenides with Atomic Force Microscopy Revealing That Sulfur Is the Preferred Chalcogen Atom for Devices Made in Ambient Conditions

Pürckhauer, Korbinian, Kirpal, Dominik, Weymouth, Alfred J. and Giessibl, Franz J. (2019) Analysis of Airborne Contamination on Transition Metal Dichalcogenides with Atomic Force Microscopy Revealing That Sulfur Is the Preferred Chalcogen Atom for Devices Made in Ambient Conditions. ACS Applied Nano Materials 2 (5), pp. 2593-2598.

Full text not available from this repository.

at publisher (via DOI)

Other URL: http://doi.org/10.1021/acsanm.9b00526


Abstract

The fabrication of devices incorporating transition metal dichalcogenides (TMDCs) is mostly done in ambient conditions, and thus the investigation of TMDCs’ cleanliness in air at the nanoscale is important. We imaged MoS2, WS2, MoSe2, and WSe2 using atomic force microscopy. Mechanical exfoliation of the TMDCs provided clean terraces on sulfides MoS2 and WS2. In contrast, the selenides appeared to ...

plus


Export bibliographical data



Item type:Article
Date:9 May 2019
Institutions:Physics > Institute of Experimental and Applied Physics > Chair Professor Giessibl > Group Franz J. Giessibl
Projects:SFB 1277: Emergente relativistische Effekte in der Kondensierten Materie: Von grundlegenden Aspekten zu elektronischer Funktionalität, SFB 689: Spinphänomene in reduzierten Dimensionen, GRK 1570, Elektronische Eigenschaften von Nanostrukturen auf Kohlenstoff-Basis
Identification Number:
ValueType
10.1021/acsanm.9b00526DOI
Keywords:AFM air ambient environment mechanical exfoliation TMDCs atomic resolution particles ice-like water
Dewey Decimal Classification:500 Science > 530 Physics
Status:Published
Refereed:Yes, this version has been refereed
Created at the University of Regensburg:Yes
Item ID:40493
Owner only: item control page
  1. Homepage UR

University Library

Publication Server

Contact:

Publishing: oa@ur.de

Dissertations: dissertationen@ur.de

Research data: daten@ur.de

Contact persons