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Comparison of different gettering techniques for Cu- p+ versus polysilicon and oxygen precipitates
Hoelzl, R., Range, K.J. and Fabry, L. (2002) Comparison of different gettering techniques for Cu- p+ versus polysilicon and oxygen precipitates. Applied Physics A: Materials Science & Processing 75 (5), pp. 591-595.Date of publication of this fulltext: 19 Dec 2024 15:36
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| Item type | Article | ||||
| Journal or Publication Title | Applied Physics A: Materials Science & Processing | ||||
| Publisher: | SPRINGER-VERLAG | ||||
|---|---|---|---|---|---|
| Place of Publication: | NEW YORK | ||||
| Volume: | 75 | ||||
| Number of Issue or Book Chapter: | 5 | ||||
| Page Range: | pp. 591-595 | ||||
| Date | 2002 | ||||
| Institutions | Chemistry and Pharmacy > Institut für Anorganische Chemie > Alumni or Retired Professors > Prof. Dr. Klaus-Jürgen Range | ||||
| Identification Number |
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| Keywords | SILICON-WAFERS; COPPER; DIFFUSION; CONTAMINATION; LIFETIME; FE; | ||||
| Dewey Decimal Classification | 500 Science > 540 Chemistry & allied sciences | ||||
| Status | Published | ||||
| Refereed | Yes, this version has been refereed | ||||
| Created at the University of Regensburg | Yes | ||||
| Item ID | 72634 |
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