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Ronning, C. ; Büttner, M. ; Vetter, U. ; Feldermann, H. ; Wondratschek, O. ; Hofsäss, H. ; Brunner, W. ; Au, Frederick C. K. ; Li, Quan ; Lee, S. T.

Ion beam deposition of fluorinated amorphous carbon

Article

Ronning, C. , Büttner, M., Vetter, U., Feldermann, H., Wondratschek, O., Hofsäss, H., Brunner, W., Au, Frederick C. K., Li, Quan and Lee, S. T. (2001) Ion beam deposition of fluorinated amorphous carbon. Journal of Applied Physics 90 (8), pp. 4237-4245.



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Details

Item typeArticle
Journal or Publication TitleJournal of Applied Physics
PublisherAMER INST PHYSICS
Place of PublicationMELVILLE
Volume90
Number of Issue or Book Chapter8
Page Rangepp. 4237-4245
Date2001
Date of publication19 Dec 2024 15:49
InstitutionsPhysics > Institute of Experimental and Applied Physics
Identification Number
ValueType
10.1063/1.1404419DOI
KeywordsLOW-DIELECTRIC-CONSTANT; DIAMOND-LIKE-CARBON; CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; INTERLAYER DIELECTRICS; THERMAL-STABILITY; HYDROGEN DILUTION; GLOW-DISCHARGE; RAMAN-SPECTRA; TA-C;
Dewey Decimal Classification500 Science > 530 Physics
StatusPublished
RefereedYes, this version has been refereed
Created at the University of RegensburgYes
Item ID73403

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