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Champagne, A. R. ; Couture, A. J. ; Kuemmeth, Ferdinand ; Ralph, D. C.

Nanometer-scale scanning sensors fabricated using stencil lithography

Champagne, A. R., Couture, A. J., Kuemmeth, Ferdinand and Ralph, D. C. (2003) Nanometer-scale scanning sensors fabricated using stencil lithography. Applied Physics Letters 82 (7), pp. 1111-1113.

Date of publication of this fulltext: 07 Apr 2026 08:48
Article
DOI to cite this document: 10.5283/epub.79092


Abstract

We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.



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Details

Item typeArticle
Journal or Publication TitleApplied Physics Letters
Publisher:American Institute of Physics (AIP) Publishing
Volume:82
Number of Issue or Book Chapter:7
Page Range:pp. 1111-1113
Date17 February 2003
InstitutionsPhysics > Institute of Experimental and Applied Physics
Identification Number
ValueType
10.1063/1.1554483DOI
Dewey Decimal Classification500 Science > 530 Physics
StatusPublished
RefereedYes, this version has been refereed
Created at the University of RegensburgNo
URN of the UB Regensburgurn:nbn:de:bvb:355-epub-790921
Item ID79092

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