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Effect of compressive and tensile strain on misfit dislocation injection in SiGe epitaxial layers

Schorer, R., Wegscheider, Werner and Abstreiter, Gerhard (1993) Effect of compressive and tensile strain on misfit dislocation injection in SiGe epitaxial layers. Journal of Vacuum Science & Technology B 11 (3), pp. 1056-1063.

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Date of publication of this fulltext: 26 Oct 2009 14:26

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Item type:Article
Date:May 1993
Institutions:Physics > Institute of Experimental and Applied Physics > Alumni or Retired Professors > Group Werner Wegscheider
Dewey Decimal Classification:500 Science > 530 Physics
Status:Published
Refereed:Unknown
Created at the University of Regensburg:Unknown
Item ID:10015
Owner only: item control page

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