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Effect of compressive and tensile strain on misfit dislocation injection in SiGe epitaxial layers
Schorer, R., Wegscheider, Werner and Abstreiter, Gerhard (1993) Effect of compressive and tensile strain on misfit dislocation injection in SiGe epitaxial layers. Journal of Vacuum Science & Technology B 11 (3), pp. 1056-1063.Date of publication of this fulltext: 26 Oct 2009 14:26
Article
DOI to cite this document: 10.5283/epub.10015
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| Item type | Article |
| Journal or Publication Title | Journal of Vacuum Science & Technology B |
| Publisher: | American Vacuum Society |
|---|---|
| Volume: | 11 |
| Number of Issue or Book Chapter: | 3 |
| Page Range: | pp. 1056-1063 |
| Date | May 1993 |
| Institutions | Physics > Institute of Experimental and Applied Physics > Alumni or Retired Professors > Group Werner Wegscheider |
| Dewey Decimal Classification | 500 Science > 530 Physics |
| Status | Published |
| Refereed | Unknown |
| Created at the University of Regensburg | Unknown |
| Item ID | 10015 |
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