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Planar Hall sensors for micro-Hall magnetometry

DOI to cite this document:
10.5283/epub.11320
Rahm, Michael ; Raabe, Jörg ; Pulwey, Ralph ; Biberger, Josef ; Wegscheider, Werner ; Weiss, Dieter ; Meier, C.
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Date of publication of this fulltext: 07 Dec 2009 13:28


Abstract

In this work we present a new method to fabricate planar Hall sensors from GaAs–AlGaAs heterojunctions, which can be used to examine the local stray field at a specific section of a micron-sized magnet. Instead of mesa etching we implanted oxygen ions with an energy of 1.5 keV which deplete the two-dimensional electron gas underneath the exposed areas but leave the wafer flat. Planar double Hall ...

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