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Doping behaviour of implanted magnesium in silicon
Sigmund, H. and Weiss, Dieter (1983) Doping behaviour of implanted magnesium in silicon. In: Ryssel, H., (ed.) Ion Implantation: Equipment and Techniques; proceedings of the 4. Internat. Conference Berchtesgaden, Fed. Rep. of Germany, Sept. 13-17, 1982. Springer Series in Electrophysics, 11. Springer, Berlin, pp. 473-480. ISBN 3-540-12491-8, 0-387-12491-8.Date of publication of this fulltext: 05 Aug 2009 13:57
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| Item type | Book section |
| ISBN | 3-540-12491-8, 0-387-12491-8 |
| Title of Book: | Ion Implantation: Equipment and Techniques; proceedings of the 4. Internat. Conference Berchtesgaden, Fed. Rep. of Germany, Sept. 13-17, 1982 |
|---|---|
| Publisher: | Springer |
| Place of Publication: | Berlin |
| Other Series: | Springer Series in Electrophysics |
| Volume: | 11 |
| Page Range: | pp. 473-480 |
| Date | 1983 |
| Institutions | Physics > Institute of Experimental and Applied Physics > Chair Professor Weiss > Group Dieter Weiss |
| Dewey Decimal Classification | 500 Science > 530 Physics |
| Status | Published |
| Refereed | Yes, this version has been refereed |
| Created at the University of Regensburg | Unknown |
| URN of the UB Regensburg | urn:nbn:de:bvb:355-epub-78478 |
| Item ID | 7847 |
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