Combined atomic force microscope and electron-beam lithography used for the fabrication of variable-coupling quantum dots

DOI zum Zitieren dieses Dokuments:: 10.5283/epub.11353

Rogge, M. C. ; Fühner, C. ; Keyser, U. F. ; Haug, R. J. ; Bichler, Max ; Abstreiter, Gerhard ; Wegscheider, Werner

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Veröffentlichungsdatum dieses Volltextes: 14 Dez 2009 13:20

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We have combined direct nanofabrication by local anodic oxidation with conventional electron-beam lithography to produce a parallel double quantum dot based on a GaAs/AlGaAs heterostructure. The combination of both nanolithography methods allows fabrication of robust in-plane gates and Cr/Au top-gate electrodes on the same device for optimal controllability. This is illustrated by the tunability ...