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- DOI zum Zitieren dieses Dokuments:
- 10.5283/epub.12489
Zusammenfassung
We study the changes of magnetoresistance induced by controlled thermal annealing at temperatures ranging from 300 to 600 °C of a Ga0.98Mn0.02As alloy grown by low-temperature molecular beam epitaxy. We use a resistor-network model for describing the electrical transport as a function of temperature and external magnetic field. The model is founded on classical semiconductor band transport and ...
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