Effect of substrate-temperature on the microstructure of thin niobium films

URN zum Zitieren dieses Dokuments:: urn:nbn:de:bvb:355-epub-188633
DOI zum Zitieren dieses Dokuments:: 10.5283/epub.18863

Surgers, C. ; Strunk, Christoph ; Löhneysen, H.

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Veröffentlichungsdatum dieses Volltextes: 22 Dez 2010 07:17

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Niobium films with constant thickness have been deposited on sapphire (11 $($) over bar$$ 20) by electron-beam evaporation at different substrate; temperatures (150 degrees C less than or equal to T-S less than or equal to 750 degrees C). The samples were characterized by X-ray diffraction and resistivity measurements. X-ray reflectivity shows that all films are covered with an oxide layer of ...