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Low, Jonathan Z. ; Kladnik, Gregor ; Patera, Laerte L. ; Sokolov, Sophia ; Lovat, Giacomo ; Kumarasamy, Elango ; Repp, Jascha ; Campos, Luis M. ; Cvetko, Dean ; Morgante, Alberto ; Venkataraman, Latha

The Environment-Dependent Behavior of the Blatter Radical at the Metal-Molecule Interface

Low, Jonathan Z., Kladnik, Gregor, Patera, Laerte L. , Sokolov, Sophia, Lovat, Giacomo , Kumarasamy, Elango, Repp, Jascha , Campos, Luis M., Cvetko, Dean, Morgante, Alberto and Venkataraman, Latha (2019) The Environment-Dependent Behavior of the Blatter Radical at the Metal-Molecule Interface. Nano Letters 19 (4), pp. 2543-2548.

Date of publication of this fulltext: 21 Mar 2019 06:29
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Item typeArticle
Journal or Publication TitleNano Letters
Publisher:AMER CHEMICAL SOC
Place of Publication:WASHINGTON
Volume:19
Number of Issue or Book Chapter:4
Page Range:pp. 2543-2548
DateMarch 2019
InstitutionsPhysics > Institute of Experimental and Applied Physics > Group Jascha Repp
Identification Number
ValueType
10.1021/acs.nanolett.9b00275DOI
KeywordsORGANIC RADICALS; THIN-FILMS; PARAMAGNETIC CHARACTER; ELECTRONIC-STRUCTURE; Organic spintronics; organic radicals; Blatter radical; spinterface; Kondo resonance; single-molecule junctions
Dewey Decimal Classification500 Science > 530 Physics
500 Science > 540 Chemistry & allied sciences
StatusPublished
RefereedYes, this version has been refereed
Created at the University of RegensburgPartially
Item ID38447

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