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Titova, Lyubov V. ; Cocker, Tyler L. ; Xu, Sijia ; Baribeau, Jean-Marc ; Wu, Xiaohua ; Lockwood, David J. ; Hegmann, Frank A.

Ultrafast carrier dynamics and the role of grain boundaries in polycrystalline silicon thin films grown by molecular beam epitaxy

Titova, Lyubov V., Cocker, Tyler L., Xu, Sijia, Baribeau, Jean-Marc, Wu, Xiaohua, Lockwood, David J. and Hegmann, Frank A. (2016) Ultrafast carrier dynamics and the role of grain boundaries in polycrystalline silicon thin films grown by molecular beam epitaxy. Semiconductor Science and Technology 31 (10), p. 105017.

Date of publication of this fulltext: 17 Mar 2020 12:08
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Item typeArticle
Journal or Publication TitleSemiconductor Science and Technology
Publisher:IOP PUBLISHING LTD
Place of Publication:BRISTOL
Volume:31
Number of Issue or Book Chapter:10
Page Range:p. 105017
Date2016
InstitutionsPhysics > Institute of Experimental and Applied Physics > Chair Professor Huber > Group Rupert Huber
Identification Number
ValueType
10.1088/0268-1242/31/10/105017DOI
KeywordsRESOLVED TERAHERTZ SPECTROSCOPY; CHEMICAL-VAPOR-DEPOSITION; TEMPERATURE SI GROWTH; AMORPHOUS-SILICON; LIMITING THICKNESS; NANOCRYSTAL FILMS; ON-SAPPHIRE; CONDUCTIVITY; SI(100); RECOMBINATION; silicon thin films; terahertz spectroscopy; grain boundaries; low-temperature MBE; carrier dynamics
Dewey Decimal Classification500 Science > 530 Physics
StatusPublished
RefereedYes, this version has been refereed
Created at the University of RegensburgYes
Item ID42970

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