| PDF - Veröffentlichte Version (1MB) |
- URN zum Zitieren dieses Dokuments:
- urn:nbn:de:bvb:355-epub-433477
- DOI zum Zitieren dieses Dokuments:
- 10.5283/epub.43347
Zusammenfassung
Valley splitting is a key feature of silicon-based spin qubits. Quantum dots in Si/SixGe1-x heterostructures reportedly suffer from a relatively low valley splitting, limiting the operation temperature and the scalability of such qubit devices. Here, we demonstrate a robust and large valley splitting exceeding 200 mu eV in a gate-defined single quantum dot, hosted in molecular-beam-epitaxy-grown ...
Nur für Besitzer und Autoren: Kontrollseite des Eintrags