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Wutscher, Thorsten ; Weymouth, Alfred J. ; Giessibl, Franz J.

Localization of the phantom force induced by the tunneling current

Wutscher, Thorsten, Weymouth, Alfred J. und Giessibl, Franz J. (2012) Localization of the phantom force induced by the tunneling current. Physical Review B (PRB) 85 (19), 195426-1-195426-6.

Veröffentlichungsdatum dieses Volltextes: 05 Jul 2012 06:06
Artikel
DOI zum Zitieren dieses Dokuments: 10.5283/epub.25267


Zusammenfassung

The phantom force is an apparently repulsive force, which can dominate the atomic contrast of an AFM image when a tunneling current is present. We described this effect with a simple resistive model, in which the tunneling current causes a voltage drop at the sample area underneath the probe tip. Because tunneling is a highly local process, the areal current density is quite high, which leads to ...

The phantom force is an apparently repulsive force, which can dominate the atomic contrast of an AFM image when a tunneling current is present. We described this effect with a simple resistive model, in which the tunneling current causes a voltage drop at the sample area underneath the probe tip. Because tunneling is a highly local process, the areal current density is quite high, which leads to an appreciable local voltage drop that in turn changes the electrostatic attraction between tip and sample. However, Si(111)-7x7 has a metallic surface state and it might be proposed that electrons should instead propagate along the surface state, as through a thin metal film on a semiconducting surface, before propagating into the bulk. In this paper, we first measure the phantom force on a sample that displays a metallic surface state [here, Si(111)-7x7] using tips with various radii. If the metallic surface state would lead to a constant electrostatic potential on the surface, we would expect a direct dependence of the phantom force with tip radius. In a second set of experiments, we study H/Si(100), a surface that does not have a metallic surface state. We conclude that a metallic surface state does not suppress the phantom force, but that the local resistance R-s has a strong effect on the magnitude of the phantom force.



Beteiligte Einrichtungen


Details

DokumentenartArtikel
Titel eines Journals oder einer ZeitschriftPhysical Review B (PRB)
Verlag:AMER PHYSICAL SOC
Ort der Veröffentlichung:COLLEGE PK
Band:85
Nummer des Zeitschriftenheftes oder des Kapitels:19
Seitenbereich:195426-1-195426-6
Datum14 Mai 2012
InstitutionenPhysik > Institut für Experimentelle und Angewandte Physik
Physik > Institut für Experimentelle und Angewandte Physik > Lehrstuhl Professor Giessibl > Arbeitsgruppe Franz J. Giessibl
Identifikationsnummer
WertTyp
10.1103/PhysRevB.85.195426DOI
Stichwörter / KeywordsFREQUENCY-SHIFTS; MICROSCOPY; SURFACE; SEMICONDUCTOR; CONDUCTANCE; SI(111)-7X7; TIP;
Dewey-Dezimal-Klassifikation500 Naturwissenschaften und Mathematik > 530 Physik
StatusVeröffentlicht
BegutachtetJa, diese Version wurde begutachtet
An der Universität Regensburg entstandenJa
URN der UB Regensburgurn:nbn:de:bvb:355-epub-252674
Dokumenten-ID25267

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