Atomic Resolution of the Silicon (111 )-(7x 7) Surface by Atomic Force Microscopy

URN to cite this document:: urn:nbn:de:bvb:355-epub-338281
DOI to cite this document:: 10.5283/epub.33828

Giessibl, Franz J.

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Date of publication of this fulltext: 31 May 2016 08:20

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Abstract

Achieving high resolution under ultrahigh-vacuum conditions with the force microscope can be difficult for reactive surfaces, where the interaction forces between the tip and the samples can be relatively large. A force detection scheme that makes use of a modified cantilever beam and senses the force gradient through frequency modulation is described. The reconstructed silicon (111)-(7x7) ...