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| PDF - Eingereichte Version arxiv v2 (228kB) |
- URN zum Zitieren dieses Dokuments:
- urn:nbn:de:bvb:355-epub-790961
- DOI zum Zitieren dieses Dokuments:
- 10.5283/epub.79096
Zusammenfassung
We measure the low-temperature resistance of permalloy break junctions as a function of contact size and the magnetic field angle in applied fields large enough to saturate the magnetization. For both nanometer-scale metallic contacts and tunneling devices we observe large changes in resistance with the angle, as large as 25% in the tunneling regime. The pattern of magnetoresistance is sensitive ...
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