| PDF - Eingereichte Version arxiv v2 (2MB) |
- URN zum Zitieren dieses Dokuments:
- urn:nbn:de:bvb:355-epub-791186
- DOI zum Zitieren dieses Dokuments:
- 10.5283/epub.79118
Zusammenfassung
Relaxation and dephasing of hole spins are measured in a gate-defined Ge/Si nanowire double quantum dot using a fast pulsed-gate method and dispersive readout. An inhomogeneous dephasing time T2* ∼ 0.18 μs exceeds corresponding measurements in III–V semiconductors by more than an order of magnitude, as expected for predominately nuclear-spin-free materials. Dephasing is observed to be exponential ...

Nur für Besitzer und Autoren: Kontrollseite des Eintrags

Downloadstatistik